■ For Thin Film Deposition
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AP-PCVD
(atmospheric-pressure plasma chemical vapor deposition) Reactor -
AP-PCVD Reactor with Rotary Electrode
■ For Materials Characterization
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1. TEM / RHEED
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2. SEM / EDX
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3. TDS
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4.XRD
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5. ICP-MS
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6. FT-IR
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7. TREX
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8. Zygo
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9.Vacuum Evaporator
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10. Spectroscopic Ellipsometer
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11. Probe Station for C-V, C-t, I-V measurements
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12.Surface Profiler
Other Equipments
- AFM
- XPS
- Raman Spectrometer
- Cathode Luminescence
- Tunable CW Laser